The FS‑1 Multi-Wavelength Ellipsometer excels at measuring the thickness and index of refraction of transparent single films, in the thickness range from 0 to 1000 nm (0 – 1 micron). The typical FS-1 measurement Accuracy and Precision for a variety of samples, including a multi-layer sample, is shown in the table below. For more details on the testing methodology, contact us and request the “FS-1 Performance” white paper.
Measurements on semi-transparent and absorbing films are possible; the main requirement for measuring a film thickness is that the light beam can at least partially penetrate through the film and reflect back from the film/substrate interface. For a typical metal, the upper limit for film thickness measurement is around 50 nm. For a semi-transparent film such as amorphous silicon, the upper limit for film thicknesses is in the 100 to 500 nm range, depending on the deposition conditions for the film (which affect the optical absorption of the film).
The FS‑1 can also determine material properties such as composition and % void content, as these properties can be directly related to the material’s index of refraction.
The FS‑1 can characterize many technologically important thin films from a wide range of industries:
- Semiconductor industry: silicon oxide and nitrides, high and low k dielectrics, amorphous and polycrystalline silicon films, photoresists
- Optical Coatings industry: high and low index films such as SiO2, TiO2, Ta2O5, MgF2, etc.
- Display industry: TCO’s (such as ITO), amorphous silicon films, organic films (for OLED technology)
- Data Storage industry: diamond like carbon (DLC) films
- Process R&D: in situ characterization of film deposition (rate and optical constants) vs. process conditions, applicable to MBE, MOCVD, ALD, Sputtering, etc.
- Chemistry and Biology: detection of sub-monolayer material adsorption in liquid cell experiments
- Industrial: in-line monitoring and control of film thickness
While spectroscopic measurements (either by spectroscopic ellipsometry or spectroscopic reflectometry) may be required to characterize samples with multiple thin films, some 2 and 3 layer film structures can also be successfully characterized by the FS‑1 Multi-Wavelength Ellipsometer. The Model ValidatorTM can help determine if a particular sample structure is possible; for more details, contact us and request the “FS-1 Software Features” white paper.
Please contact us to discuss if the FS‑1 is right for your thin film application. Or better yet, let us demonstrate the measurement capabilities of the FS‑1 by performing free measurements on your samples!